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Journal of Materials Science

, Volume 27, Issue 10, pp 2739–2742 | Cite as

Application of a molecular precursor to the preparation of tungsten and beta-tungsten nitride coatings and powders

  • A. L. Currie
  • K. E. Howard
Papers

Abstract

The use of the tungsten imido/amido complex (N-H-t-Bu)2W(N-t-Bu)2 (Complex 1) (CAS number 72207-45-5) as a precursor to tungsten and tungsten nitride films, coatings and powders is reported. The alkane-soluble Complex 1 exhibits high solubility in solvents such as hexane and toluene, making it amenable to application to substrates via dip-coating or spotspraying. This avoids the necessity of vapour deposition methods and the, presently common, use of tungsten fluorides. Thermolysis in an ammonia/nitrogen, ammonia/argon or exclusively nitrogen atmosphere at temperatures between 600 and 1200°C provided a coating or powder comprised of elemental tungsten (75–95 mol%) and tungsten nitride (25-5 mol%). Oxygen content of these materials is less than 0.5%. Thermolysis in an argon atmosphere produced a coating on AIN substrates which were found to contain no β-W2N (as detectable by X-ray diffraction), only tungsten metal. The coating was successfully applied to sintered aluminium nitride electronic and structural substrates. A coated aluminium nitride substrate exhibited improvement in erosion resistance when compared to an uncoated specimen.

Keywords

Tungsten Nitride Thermolysis Erosion Resistance Nitride Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1992

Authors and Affiliations

  • A. L. Currie
    • 1
  • K. E. Howard
    • 1
  1. 1.Central Research, Advanced Ceramics LaboratoryThe Dow Chemical CompanyMidlandUSA

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