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Journal of Materials Science

, Volume 29, Issue 3, pp 669–675 | Cite as

Morphology and preferred orientation of titanium nitride plates prepared by chemical vapour deposition

  • C. Jiang
  • T. Goto
  • T. Hirai
Papers

Abstract

Thick titanium nitride (TiNx; x = 0.74–1.0) plates (up to 2 mm thick) were prepared by chemical vapour deposition using TiCl4, NH3 and H2 as source gases at a total gas pressure, Ptot, of 4 kPa, deposition temperatures, Tdep, from 1373–1873 K, and NH3/TiCl4, mN/Ti, gas molar ratio from 0.17–1.74. The effects of deposition conditions on morphology, preferred orientation and composition of CVD-TiNx plates were investigated. Surface morphology changed from faceted to nodular texture with increasing mN/Ti and Tdep. The faceted and nodular deposits showed columnar and shell-like fracture cross-sections, respectively. The composition (x = N/Ti) increased with increasing mN/Ti and Tdep below mN/Ti = 1.0, and was constant above mN/Ti = 1.0. Three kinds of preferred orientations were observed: (100) orientation at low Tdep, (110) orientation at intermediate Tdep and low mN/Ti, and (111) orientation at high Tdep and high mN/Ti. This tendency is discussed thermodynamically, and explained as being due to changes in the degree of supersaturation in the gas phase.

Keywords

Nitride Surface Morphology Chemical Vapour Deposition Supersaturation Prefer Orientation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • C. Jiang
    • 1
  • T. Goto
    • 1
  • T. Hirai
    • 1
  1. 1.Institute for Materials ResearchTohoku UniversitySendaiJapan

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