Journal of Materials Science

, Volume 29, Issue 3, pp 669–675 | Cite as

Morphology and preferred orientation of titanium nitride plates prepared by chemical vapour deposition

  • C. Jiang
  • T. Goto
  • T. Hirai


Thick titanium nitride (TiNx; x = 0.74–1.0) plates (up to 2 mm thick) were prepared by chemical vapour deposition using TiCl4, NH3 and H2 as source gases at a total gas pressure, Ptot, of 4 kPa, deposition temperatures, Tdep, from 1373–1873 K, and NH3/TiCl4, mN/Ti, gas molar ratio from 0.17–1.74. The effects of deposition conditions on morphology, preferred orientation and composition of CVD-TiNx plates were investigated. Surface morphology changed from faceted to nodular texture with increasing mN/Ti and Tdep. The faceted and nodular deposits showed columnar and shell-like fracture cross-sections, respectively. The composition (x = N/Ti) increased with increasing mN/Ti and Tdep below mN/Ti = 1.0, and was constant above mN/Ti = 1.0. Three kinds of preferred orientations were observed: (100) orientation at low Tdep, (110) orientation at intermediate Tdep and low mN/Ti, and (111) orientation at high Tdep and high mN/Ti. This tendency is discussed thermodynamically, and explained as being due to changes in the degree of supersaturation in the gas phase.


Nitride Surface Morphology Chemical Vapour Deposition Supersaturation Prefer Orientation 
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  1. 1.
    D. P. Stinton, T. M. Besmann and R. A. Lowden, Am. Ceram. Soc. Bull. 67 (1988) 350.Google Scholar
  2. 2.
    J. E. Sundgren, Thin Solid Films 128 (1985) 21.CrossRefGoogle Scholar
  3. 3.
    K. H. Habig, J. Vac. Sci. Technol. A4 (1986) 2832.CrossRefGoogle Scholar
  4. 4.
    P. J. Burnett and D. S. Rickerby, J. Mater. Sci. 23 (1988) 2429.CrossRefGoogle Scholar
  5. 5.
    W. D. Sproul, J. Vac. Sci. Technol. A4 (1986) 2874.CrossRefGoogle Scholar
  6. 6.
    J. S. Cho, S. W. Nam and J. S. Chun, J. Mater. Sci. 17 (1982) 2495.CrossRefGoogle Scholar
  7. 7.
    M. S. Kim and J. S. Chun, Thin Solid Films 107 (1983) 129.CrossRefGoogle Scholar
  8. 8.
    C. H. J. Van Den Brekel, R. M. M. Fonville, P. J. M. Van Der Straten and G. Verspui, in “Proceedings of the 8th International Conference on Chemical Vapour Deposition”, edited by J. M. Blocher, J. Wahl and G. E. Vuillard (Electrochemical Society, Princeton, NJ, 1981) p. 142.Google Scholar
  9. 9.
    F. Teyssandier, C. Bernard and M. Ducarroir, in “Proceedings of the 6th European Conference on Chemical Vapor Deposition”, edited by R. Porat (Iscar, Jerusalem, 1987) p. 96.Google Scholar
  10. 10.
    T. Sadahiro, T. Cho and S. Yamaya, J. Jpn Inst. Metals 41 (1977) 542.CrossRefGoogle Scholar
  11. 11.
    T. Takahashi and Y. Suzuki, Nippon Kagaku Kaisi 6 (1974) 1043.CrossRefGoogle Scholar
  12. 12.
    T. Takahashi and H. Itoh, J. Electrochem. Soc. 124 (1977) 797.CrossRefGoogle Scholar
  13. 13.
    K. Niihara and T. Hirai, J. Mater. Sci. 11 (1976) 593.CrossRefGoogle Scholar
  14. 14.
    T. Goto, J. Tsuneyoshi, K. Kaya and T. Hirai, J. Mater. Sci. 27 (1992) 247.CrossRefGoogle Scholar
  15. 15.
    T. Matsuda, N. Uno, H. Nakae and T. Hirai, ibid. 21 (1986) 649.CrossRefGoogle Scholar
  16. 16.
    C. Jiang, T. Goto and T. Hirai, to be published in J. Mater. Sci. Google Scholar
  17. 17.
    T. Hirai, T. Goto and T. Kaji, Yogyo-Kyokai-Shi 91 (1983) 502.CrossRefGoogle Scholar
  18. 18.
    C. S. Barrett and T. B. Massalaki, in “Structure of Metals” (Pergamon, Oxford, 1980) p. 205.Google Scholar
  19. 19.
    N. A. Pangarov, Electrochim. Acta 9 (1964) 721.CrossRefGoogle Scholar
  20. 20.
    M. Mukaida, T. Goto and T. Hirai, J. Mater. Sci. 26 (1991) 6613.CrossRefGoogle Scholar
  21. 21.
    T. M. Besmann, Oakridge National Laboratory Technical Report ORNL/TM-5775 (April, 1975).Google Scholar
  22. 22.
    D. R. Stull and H. Prophet (eds), “JANAF Thermochemical Tables”, 2nd Edn, NSRDS-NMS-37 (US Government Printing Office, Washington, DC, 1971).Google Scholar

Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • C. Jiang
    • 1
  • T. Goto
    • 1
  • T. Hirai
    • 1
  1. 1.Institute for Materials ResearchTohoku UniversitySendaiJapan

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