Surface morphology of r.f. sputtered bismuth titanate thin films
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Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.
KeywordsPolymer Microstructure Thin Film Titanate Surface Morphology
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