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Journal of Materials Science

, Volume 29, Issue 17, pp 4659–4662 | Cite as

Surface morphology of r.f. sputtered bismuth titanate thin films

  • P. K. Ghosh
  • A. S. Bhalla
  • L. E. Cross
Papers

Abstract

Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.

Keywords

Polymer Microstructure Thin Film Titanate Surface Morphology 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • P. K. Ghosh
    • 1
  • A. S. Bhalla
    • 2
  • L. E. Cross
    • 2
  1. 1.Department of Electrical and Computer EngineeringSyracuse UniversitySyracuseUSA
  2. 2.Materials Research LarboratoryThe Pennsylvania State UniversityUniversity ParkUSA

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