Journal of Materials Science

, Volume 29, Issue 17, pp 4659–4662 | Cite as

Surface morphology of r.f. sputtered bismuth titanate thin films

  • P. K. Ghosh
  • A. S. Bhalla
  • L. E. Cross


Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.


Polymer Microstructure Thin Film Titanate Surface Morphology 
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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • P. K. Ghosh
    • 1
  • A. S. Bhalla
    • 2
  • L. E. Cross
    • 2
  1. 1.Department of Electrical and Computer EngineeringSyracuse UniversitySyracuseUSA
  2. 2.Materials Research LarboratoryThe Pennsylvania State UniversityUniversity ParkUSA

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