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Journal of Materials Science

, Volume 31, Issue 7, pp 1879–1885 | Cite as

An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas

  • M. R. Alexander
  • R. D. Short
  • F. R. Jones
  • M. Stollenwerk
  • J. Zabold
  • W. Michaeli
Article

Abstract

The effect of oxygen addition to microwave-sustained plasmas of hexamethyldisiloxane (HMDSO) has been investigated. Attention was directed to the solid products formed on aluminium substrates (plasma deposits). To enable a quantitative analysis of these, X-ray photoelectron spectroscopy (XPS) of standard silicon-containing materials was carried out. When suitable charge correction is applied to the XP spectra of HMDSO/O2 plasma deposits, a number of very clear trends emerge. From changes in elemental composition, core line binding energies (Si2p, C 1s, and O 1s) and widths, we show how oxygen addition to the plasma affects the chemical nature of the plasma deposit. The data reported also provide (some limited) information on the reactions taking place in the plasma.

Keywords

Elemental Composition Chemical Nature Clear Trend Solid Product Oxygen Plasma 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1996

Authors and Affiliations

  • M. R. Alexander
    • 1
  • R. D. Short
    • 1
  • F. R. Jones
    • 1
  • M. Stollenwerk
    • 2
  • J. Zabold
    • 2
  • W. Michaeli
    • 2
  1. 1.Laboratory for Surface and Interface Analysis, Department of Engineering MaterialsUniversity of SheffieldSheffieldUK
  2. 2.Institut Für KunststoffverarbeitungRWTH AachenAachenGermany

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