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Journal of Materials Science

, Volume 29, Issue 6, pp 1646–1651 | Cite as

Change in the chemical structures of carbon black and active carbon caused by CF4 plasma irradiation

  • M. Nakahara
  • K. Ozawa
  • Y. Sanada
Papers

Abstract

Carbon black and active carbon were fluorinated by exposure to CF4 plasma. Their surface chemical structures were studied by means of elemental analysis, X-ray photoelectron spectroscopy, and inverse gas chromatography as a function of treatment time. Fluorine is mainly introduced onto the carbon black and active carbon surfaces during the CF4 plasma treatment. The amount and type of carbon-fluorine (C-F) functionality formed on the surfaces of the carbon materials depends on the C-C framework structure as well as the plasma treatment time. C1s chemical shifts caused by C-F bonds on the fluorinated active carbon and carbon black surfaces are slightly different from those reported on the various types of fluorinated organic polymers, and have a somewhat ionic character. For the fluorinated active carbon the C-F bond is relatively stable, whereas for the fluorinated carbon black the C-F bond is unstable and has a significant ionic character. In addition, CO2 gas adsorption characteristics on the fluorinated active carbon can be controlled by the surface C-F functionality.

Keywords

Active Carbon Fluorine Plasma Treatment Framework Structure Adsorption Characteristic 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • M. Nakahara
    • 1
  • K. Ozawa
    • 1
  • Y. Sanada
    • 1
  1. 1.Metals Research Institute, Faculty of EngineeringHokkaido UniversitySapporo 060Japan

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