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Journal of Materials Science

, Volume 29, Issue 6, pp 1589–1594 | Cite as

Parametric study of the chemical vapour deposition of carbon-boron-nitrogen compounds

  • A. Derre
  • L. Filipozzi
  • F. Bouyer
  • A. Marchand
Papers

Abstract

The influence of various parameters controlling the chemical vapour deposition of carbon-boron-nitrogen mixtures has been studied using the experimental designs methodology which provides a valuable phenomenological approach for the initial study of complicated chemical systems. The gaseous precursors used were acetylene (C2H2), boron trichloride (BCl3), and ammonia (NH3). An extended experimental field was investigated, which leads to a very wide composition range for the deposits. All the deposits may be described as hexagonal single phase, including the C-BN-“BC3” ternary domain. In this composition triangle, no thermodynamically stable boron carbides were found.

Keywords

Carbide Boron C2H2 Acetylene Chemical Vapour Deposition 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • A. Derre
    • 1
  • L. Filipozzi
    • 1
  • F. Bouyer
    • 1
  • A. Marchand
    • 1
  1. 1.Centre de Recherche Paul PascalCNRSPessacFrance

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