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Journal of Materials Science

, Volume 31, Issue 3, pp 713–720 | Cite as

Preparation of BN films by r.f. thermal plasma chemical vapour deposition

  • S. Matsumoto
  • N. Nishida
  • K. Akashi
  • K. Sugai
Papers

Abstract

Boron nitride films were prepared at 1 atm by r.f. thermal plasma chemical vapour deposition from the gas systems of Ar-BF3-N2 (or NH3, NF3)-H2, Ar-BCl3-N2 (or NH3, NF3)-H2, and Ar-B2H6-N2 (or NH3)-H2. The appearance and the deposition rate of the films changed drastically with the composition of the feed gas. Only from the Ar-BF3-N2(-NF3) gas, were transparent and smooth films obtained, while from other gas systems, white flaky or powder-like deposits formed. The structure of these films was basically sp2-bonded turbostratic BN, and the formation of cubic BN was not confirmed.

Keywords

Polymer Boron Nitride Chemical Vapour Deposition Vapour Deposition 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1996

Authors and Affiliations

  • S. Matsumoto
    • 1
  • N. Nishida
    • 2
  • K. Akashi
    • 2
  • K. Sugai
    • 3
  1. 1.National Institute for Research in Inorganic MaterialsTsukuba-shiJapan
  2. 2.Department of Industrial and Engineering Chemistry, Faculty of Science TechnologyScience University of TokyoNoda-shiJapan
  3. 3.Nachi-Fujikoshi Corp.Toyama-shiJapan

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