Journal of Materials Science

, Volume 31, Issue 3, pp 713–720 | Cite as

Preparation of BN films by r.f. thermal plasma chemical vapour deposition

  • S. Matsumoto
  • N. Nishida
  • K. Akashi
  • K. Sugai


Boron nitride films were prepared at 1 atm by r.f. thermal plasma chemical vapour deposition from the gas systems of Ar-BF3-N2 (or NH3, NF3)-H2, Ar-BCl3-N2 (or NH3, NF3)-H2, and Ar-B2H6-N2 (or NH3)-H2. The appearance and the deposition rate of the films changed drastically with the composition of the feed gas. Only from the Ar-BF3-N2(-NF3) gas, were transparent and smooth films obtained, while from other gas systems, white flaky or powder-like deposits formed. The structure of these films was basically sp2-bonded turbostratic BN, and the formation of cubic BN was not confirmed.


Polymer Boron Nitride Chemical Vapour Deposition Vapour Deposition 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    M. SOKOLOWSKI, J. Crystal Growth 46 (1979) 136.CrossRefGoogle Scholar
  2. 2.
    C. WEISSMANTEL, K. BEWILOGUA, D. DIETRICH, H.-J. ERLER, H.-J. HINNEBERG, S. KLOSE, W. NOWICK and G. REISE, Thin Solid Films 72 (1980) 19.CrossRefGoogle Scholar
  3. 3.
    M. SATOU and F. FUJIMOTO, Jpn J. Appl. Phys. 22 (1983) L171.CrossRefGoogle Scholar
  4. 4.
    S. SHANFIELD and R. WOLFSON, J. Vac. Sci. Technol. A1 (1983) 323.CrossRefGoogle Scholar
  5. 5.
    K. INAGAWA, K. WATANABE, I. TANAKA, S. SAITOH and A. ITOH, in “Proceedings of the 9th Symposium on Ion Source and Ion-assisted Technology” (ISIAT), edited by T. TAKAGI (Ion Beam Eng. Exp. Lab., Kyoto University, Kyoto, Japan, 1985) p. 299.Google Scholar
  6. 6.
    A. CHAYAHARA, H. YOKOYAMA, T. IMURA and Y. OSAKA, Jpn J. Appl. Phys. 26 (1987) L1435.CrossRefGoogle Scholar
  7. 7.
    S. KOMATSU, K. AKASHI and T. YOSHIDA, in “Proceedings of the 7th International Symposium on Plasma Chemistry”, Eindhoven, July 1985, edited by C. J. Timmerman (IUPAC Subcommittee of Plasma Chemistry, 1985) p. 142.Google Scholar
  8. 8.
    H. SAITOH, T. ISHIGURO and Y. ICHINOSE, in “Proceedings of the 8th International Symposium on Plasma Chemistry”, Tokyo, August 1987, edited by K. Akashi and A. Kimbara (IUPAC Subcommittee of Plasma Chemistry, 1987) 1148.Google Scholar
  9. 9.
    H. SAITOH and W. A. YARBROUGH, Appl. Phys. Lett. 88 (1991) 2228.CrossRefGoogle Scholar
  10. 10.
    S. Y. SHAPOVAL, V. T. PETRASHOV, O. A. POPOV, A. O. WESTNER, M. D. YODAR and C. K. C. LOK, ibid. 57 (1990) 1885.CrossRefGoogle Scholar
  11. 11.
    M. MENDEZ, S. MUHL, M. FARIAS, G. SOTO and L. COTA-ARAIZA, Surf. Coat. Technol. 41 (1991) 422.CrossRefGoogle Scholar
  12. 12.
    S. MATSUMOTO, M. HINO and T. KOBAYASHI, Appl. Phys. Lett. 51 (1987) 737.CrossRefGoogle Scholar
  13. 13.
    J. THOMAS Jr, N. E. WESTON and T. E. O'CONNOR, J. Am. Chem. Soc. 24 (1963) 4619.Google Scholar
  14. 14.
    C. GUIMON, D. GONBEAU, G. PFISTER-GUILLOUZO, O. DUGNE, A. GUETTE, R. NASLAIN and M. LAHAYE, Surf. Interface Anal. 16 (1990) 440.CrossRefGoogle Scholar
  15. 15.
    R. A. NYQUIST and R. O. KAGEL, “Infrared Spectra of Inorganic Compounds” (Academic Press, New York, 1971).CrossRefGoogle Scholar
  16. 16.
    W. R. SMITH and R. W. MISSEN, “Chemical Reaction Equilibrium Analysis” (Wiley, New York, 1982).Google Scholar
  17. 17.
    D. STULL and H. PROPHET (project directors), “JANAF Thermochemical Tables”, 2nd Edn (American Chemical Society and American Physics Institute for the National Bureau of Standards, the Superintendent of Documents, US Government Print Office, 1972).Google Scholar

Copyright information

© Chapman & Hall 1996

Authors and Affiliations

  • S. Matsumoto
    • 1
  • N. Nishida
    • 2
  • K. Akashi
    • 2
  • K. Sugai
    • 3
  1. 1.National Institute for Research in Inorganic MaterialsTsukuba-shiJapan
  2. 2.Department of Industrial and Engineering Chemistry, Faculty of Science TechnologyScience University of TokyoNoda-shiJapan
  3. 3.Nachi-Fujikoshi Corp.Toyama-shiJapan

Personalised recommendations