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Journal of Materials Science

, Volume 29, Issue 22, pp 5887–5891 | Cite as

Nanometer-scale chemical compatibility between nickel aluminide and MgO films

  • M. Nathan
  • C. R. Anderson
  • J. S. Ahearn
Article

Abstract

The stability of the NiAl/MgO interface at temperatures in the range 800–1000‡C was studied on layered thin films of MgO/(Ni+Al)/MgO, using electron diffraction in transmission electron microscopy, and X-ray photoelectron spectroscopy. NiAl was formed by rapid thermal annealing (RTA) of the films at 300‡C, without affecting the interface. RTA at 800‡C, for 5 min induced a limited interfacial reaction which formed a spinel phase and Ni3Al, but left most of the NiAl and MgO layers intact. In the earliest reaction stages, aluminium diffuses out from, and oxygen diffuses into NiAl. After RTA at 1000‡C for 100s, the NiAl layer disintegrates completely, while the magnesium apparently evaporates from the MgO. While the NiAl/MgO system is shown to be chemically incompatible on the nanoscale, comparison with other aluminide/reinforcement systems shows it to be one of the more stable ones.

Keywords

Nickel Magnesium Transmission Electron Microscopy Electron Diffraction Material Processing 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • M. Nathan
    • 1
  • C. R. Anderson
    • 1
  • J. S. Ahearn
    • 1
  1. 1.Martin Marietta LaboratoriesBaltimoreUSA

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