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Journal of Materials Science

, Volume 31, Issue 13, pp 3567–3572 | Cite as

Silicide formation by solid-state diffusion in MO/Si multilayer thin films

  • Eungjoon Chi
  • Jaeyeob Shim
  • Joonseop Kwak
  • Hongkoo Baik
Papers

Abstract

The solid-state reaction of Mo/Si multilayer thin films produced by the r.f. magnetron sputtering technique was examined using differential scanning calorimetry (DSC) and X-ray diffraction and was explained by the concepts of effective driving force and effective heat of formation. In constant scanning-rate DSC, there were two exothermic peaks representing the formation of h-MoSi2 and t-MoSi2, respectively. The activation energy for the formation of h-MoSi2 was 1.5 eV, and that of t-MoSi2 was 7.8 eV. Nucleation was the rate-controlling mechanism for each silicide formation. The amorphous phase was not formed in the Mo/Si system as predicted by the concept of effective driving force. h-MoSi2, the first crystalline phase, was considered to have lower interfacial free energy than t-MoSi2, and by increasing the temperature, it was transformed into more stable t-MoSi2.

Keywords

Polymer Activation Energy Free Energy Differential Scanning Calorimetry Calorimetry 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    M. A. Nicolet and S. S. Lau, “VLSI Electronics Microstructure Science”, Vol. 6 (Academic Press, New York, 1983).Google Scholar
  2. 2.
    U. Gösele and K. N. Tu, J. Appl. Phys. 66 (1989) 2619.CrossRefGoogle Scholar
  3. 3.
    K. N. Tu, G. Ottaviani, U. Gösele and H. Föil, ibid. 54 (1983) 758.CrossRefGoogle Scholar
  4. 4.
    F. Bordeaux and A. R. Yavari, ibid. 67 (1990) 2385.CrossRefGoogle Scholar
  5. 5.
    A. Petforsd-Long, M. B. Stearns, C.-H. Chang, S. R. Nutt, D. G. Stearns, N. M. Ceglio and A. M. Hawryluk, ibid. 61 (1987) 1422.CrossRefGoogle Scholar
  6. 6.
    J. S. Kwak, E. J. Chi, J. D. Choi, S. W. Park, H. K. Baik, M. G. So and S. M. Lee, J. Korean Vac. Soc. 2 (1993) 50.Google Scholar
  7. 7.
    R. Pretorius, A. M. Vredenberg and F. W. Saris, J. Appl. Phys. 70 (1991) 3636.CrossRefGoogle Scholar
  8. 8.
    H. E. Kissinger, Anal. Chem. 29 (1957) 1702.CrossRefGoogle Scholar
  9. 9.
    U. Gösele and K. N. Tu, J. Appl. Phys. 53 (1982) 3252.CrossRefGoogle Scholar
  10. 10.
    F. M. D'heurle, J. Mater. Res. 3 (1988) 167.CrossRefGoogle Scholar
  11. 11.
    L. A. Clevenger and C. V. Thompson, J. Appl. Phys. 67 (1990) 1325.CrossRefGoogle Scholar
  12. 12.
    O. B. Loopstra, W. G. Sloof, T. H. de Keijser, E. J. Mittemeijer, S. Radelaar, A. E. Kuiper and R. A. M. Wolters, ibid. 63 (1988) 4960.CrossRefGoogle Scholar
  13. 13.
    E. J. Cotts and W. L. Johnson, Phys. Rev. B. 37 (1988) 9049.CrossRefGoogle Scholar
  14. 14.
    S. F. Gong and H. T. G. Hentzell, J. Appl. Phys. 68 (1990) 4542.CrossRefGoogle Scholar
  15. 15.
    A. R. Miedema, Philips Tech. Rev. 36 (1976) 217.Google Scholar
  16. 16.
    F. Y. Shiau, PhD thesis, University of Wisconsin-Madison 1990).Google Scholar
  17. 17.
    C.-D. Lien and M. A. Nicolet, J. Vac. Sci. Technol. B 2 (1984) 738.CrossRefGoogle Scholar
  18. 18.
    F. Nava, G. Majni, P. Cantoni, G. Pignatel, G. Ferla, P. Cappelletti and F. Mori, Thin Solid Films 94 (1982) 59.CrossRefGoogle Scholar
  19. 19.
    T. B. Massalski, “Binary Alloy Phase Diagrams” (American Society for Metals, Metals Park, Ohio, 1986).Google Scholar
  20. 20.
    R. M. Walser and R. W. Bene, Appl. Phys. Lett. 28 (1976) 624.CrossRefGoogle Scholar
  21. 21.
    C. M. Donald and R. J. Nemanich, J. Mater. Res. 5 (1990) 2854.CrossRefGoogle Scholar
  22. 22.
    W. D. Pearson, “The Crystal Chemistry and Physics of Metals and Alloys” (Wiley, New York, 1972).Google Scholar
  23. 23.
    J.-H. Xu and A. J. Freeman, Phys. Rev. B 40 (1989) 11927.CrossRefGoogle Scholar

Copyright information

© Chapman & Hall 1996

Authors and Affiliations

  • Eungjoon Chi
    • 1
  • Jaeyeob Shim
    • 1
  • Joonseop Kwak
    • 1
  • Hongkoo Baik
    • 1
  1. 1.Department of Metallurgical EngineeringYonsei UniversitySeoulKorea

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