Journal of Materials Science

, Volume 30, Issue 20, pp 5178–5184 | Cite as

R-curve behaviour and microstructure of sintered silicon nitride

  • Young -Wook Kim
  • M. Mitomo
  • N. Hirosaki


R-curves for two in situ reinforced silicon nitrides A and B, of different microstructures, were characterized using indentation-crack growth measurements. Silicon nitride B, with its coarser microstructure and 8 MPa m1/2 toughness, showed higher resistance to crack growth and more damage tolerance than silicon nitride A, with its finer microstructure and 7 MPa m1/2 toughness. However, silicon nitride A showed a higher Weibull modulus than that of silicon nitride B due to the relatively narrow critical grain-size distribution. These results suggest that a coarse microstructure with narrow flaw-size distribution is beneficial to toughening, damage tolerance, and reliability.


Polymer Silicon Microstructure Nitride High Resistance 
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Copyright information

© Chapman & Hall 1995

Authors and Affiliations

  • Young -Wook Kim
    • 1
  • M. Mitomo
    • 1
  • N. Hirosaki
    • 2
  1. 1.National Institute for Research in Inorganic MaterialsIbarakiJapan
  2. 2.Materials Research LaboratoryNissan Research Centre, Nissan Motor Company LtdYokosukaJapan

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