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Journal of Materials Science

, Volume 30, Issue 20, pp 5178–5184 | Cite as

R-curve behaviour and microstructure of sintered silicon nitride

  • Young -Wook Kim
  • M. Mitomo
  • N. Hirosaki
Article

Abstract

R-curves for two in situ reinforced silicon nitrides A and B, of different microstructures, were characterized using indentation-crack growth measurements. Silicon nitride B, with its coarser microstructure and 8 MPa m1/2 toughness, showed higher resistance to crack growth and more damage tolerance than silicon nitride A, with its finer microstructure and 7 MPa m1/2 toughness. However, silicon nitride A showed a higher Weibull modulus than that of silicon nitride B due to the relatively narrow critical grain-size distribution. These results suggest that a coarse microstructure with narrow flaw-size distribution is beneficial to toughening, damage tolerance, and reliability.

Keywords

Polymer Silicon Microstructure Nitride High Resistance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1995

Authors and Affiliations

  • Young -Wook Kim
    • 1
  • M. Mitomo
    • 1
  • N. Hirosaki
    • 2
  1. 1.National Institute for Research in Inorganic MaterialsIbarakiJapan
  2. 2.Materials Research LaboratoryNissan Research Centre, Nissan Motor Company LtdYokosukaJapan

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