Journal of Materials Science

, Volume 29, Issue 15, pp 4037–4042 | Cite as

An investigation of the Ar+ ion-enhanced reaction of CCl4 on Si(100) by secondary ion mass spectrometry

  • A. T. S. Wee
  • C. H. A. Huan
  • K. L. Tan
  • R. S. K. Tan


The Ar+ ion-enhanced reaction of carbon tetrachloride (CCl4) on Si(100) at room temperature is investigated at primary ion energies of 2 and 9 keV using the secondary ion mass spectrometry (SIMS) technique. Static SIMS shows that CCl4 reacts with Si at room temperature. This surface reaction is enhanced by simultaneous sputtering with an Ar+ ion beam, the reaction rate being higher at 9 keV than at 2 keV. Possible products of surface reaction are discussed.


Polymer Mass Spectrometry CCl4 Material Processing Tetrachloride 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    D. L. Flamm, Pure Appl. Chem. 62 (1990) 1709.CrossRefGoogle Scholar
  2. 2.
    M. Komuro, N. Watanabe and H. Hiroshima, Jap. J. Appl. Phys. 29 (1990) 2288.CrossRefGoogle Scholar
  3. 3.
    C. L. French, R. B. Jackman, R. J. Price and J. S. Foord, J. Phys.: Condens. Matter 1 (1989) SB181.Google Scholar
  4. 4.
    K. Wittmaack, Surf. Sci. 90 (1979) 557.CrossRefGoogle Scholar
  5. 5.
    M. J. Hearns and D. Briggs, Surf. Interface Anal. 9 (1986) 411.Google Scholar
  6. 6.
    J. Maul and K. Wittmaack, Surf. Sci. 47 (1975) 358.CrossRefGoogle Scholar
  7. 7.
    R. S. K. Tan, “Surface studies of reactive ion beam etching of silicon with carbon tetrachloride,” Honours Dissertation, Department of Physics, National University of Singapore (1992).Google Scholar
  8. 8.
    D. Briggs, A. Brown and J. C. Vickerman, “Handbook of Static Secondary Ion Mass Spectrometry” (Wiley, Chichester, 1989) pp. 6–7.Google Scholar
  9. 9.
    P. Williams, Surf. Sci. 90 (1979) 588.CrossRefGoogle Scholar
  10. 10.
    G. E. Thomas, Radiat. Eff. 31 (1977) 185.CrossRefGoogle Scholar
  11. 11.
    C. Plog and W. Gerhard, Surf. Sci. 152/153 (1985) 127.CrossRefGoogle Scholar
  12. 12.
    C. Plog, G. Roth, W. Gerhard and W. Kerfin, in “Secondary Ion Mass Spectrometry SIMS V.” edited by A. Benninghoven, R. J. Colton, D. S. Simons and H. W. Werner, Springer Series in Chemical Physics Vol. 44 (Springer, New York, 1986) p. 29.Google Scholar
  13. 13.
    K. J. Hook, T. J. Hook, J. H. Wandass and J. A. Gardella Jr, Appl. Surf. Sci. 44 (1990) 29.CrossRefGoogle Scholar
  14. 14.
    R. G. Cooks and K. L. Busch, Int. J. Mass Spec. Ion Phys. 53 (1983) 111.CrossRefGoogle Scholar
  15. 15.
    P. E. Clarke, D. Field and D. F. Klemperer, J. Appl. Phys. 67 (1990) 1525.CrossRefGoogle Scholar
  16. 16.
    R. B. Jackman, H. Ebert and J. S. Foord, Surf. Sci. 176 (1986) 183.CrossRefGoogle Scholar

Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • A. T. S. Wee
    • 1
  • C. H. A. Huan
    • 1
  • K. L. Tan
    • 1
  • R. S. K. Tan
    • 1
  1. 1.Department of PhysicsNational University of SingaporeSingaporeSingapore

Personalised recommendations