Journal of Materials Science

, Volume 29, Issue 13, pp 3542–3552 | Cite as

Ion-bombardment modification of surface morphology of solids

Part 2 Changes in surface shape
  • Zbigniew W. Kowalski


Ion bombardment modification of surface geometrical structure, i.e. surface roughness alteration (Part 1) and changes in surface shape (this paper) are considered. Two surface shape alteration methods, masked and maskless pattern etching, are described. They have been applied to modify various kinds of targets, including metals (99.9% aluminium and 99.9% titanium), metal alloys (stainless steel of 1H18N9T and SS 316 LC), alumina ceramic (96% Al2O3) and Teflon. The results of experiments, where narrow beam glow discharge (GD) and broad beam Kaufman type guns have been used as ion sources, are presented. Approximation of a real surface shape profile by a so-called “mean line”, which is very helpful in the case of ion patterned but extremely rough surfaces, is also discussed. Finally, the practical aspects of ion bombardment modification of surface shape phenomenon, i.e. its application to sputtering yield and sputtering velocity measurements, are shown.


Titanium Al2O3 Rough Surface Velocity Measurement Geometrical Structure 
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  1. 1.
    Z. W. Kowalski, Science Papers IET TU Wrocław No. 38, Monographs No. 13, edited by PWr (Wrocław, 1989).Google Scholar
  2. 2.
    Idem, J. Mater. Sci. 25 (1990) 3875.CrossRefGoogle Scholar
  3. 3.
    O. Auciello, in “Ion Bombardment Modification of Surfaces: Fundamentals and Applications”, edited by O. Auciello and R. Kelly (Elsevier, Amsterdam, 1984) p. 435.Google Scholar
  4. 4.
    L. F. Johnson, ibid. “Ion Bombardment Modification of Surfaces: Fundamentals and Applications”, edited by O. Auciello and R. Kelly eds (Elsevier, Amsterdam, 1984) p. 361.Google Scholar
  5. 5.
    I. W. Rangelow and Z. W. Kowalski, Beitr. elektronenmikroskop. Direktabb. Oberfl. 15 (1982) 27.Google Scholar
  6. 6.
    A. J. Muray and J. J. Muray, Vacuum 35 (1985) 467.CrossRefGoogle Scholar
  7. 7.
    J. Melngailis, J. Vac. Sci. Technol. B5 (1987) 469.CrossRefGoogle Scholar
  8. 8.
    S. Namba, Nucl. Instr. Meth. in Phys. Res. B39 (1989) 504.CrossRefGoogle Scholar
  9. 9.
    R. A. D. Mackenzie and G. D. W. Smith, Nanotechnology 1 (1990) 163.CrossRefGoogle Scholar
  10. 10.
    M. Łukaszewicz and Z. W. Kowalski, J. Mater. Sci. 16 (1981) 302.CrossRefGoogle Scholar
  11. 11.
    Z. W. Kowalski, J. Wilk and W. Krysiński, in Proceedings ELTE '90, IV Konferencja Naukowa — Technologia Elektronowa, Ksíaź 11-14.09.1990, Wyd. PWr (Wrocław, 1990) p. 242.Google Scholar
  12. 12.
    W. Hauffe, in “Sputtering by particle bombardment III”, edited by R. Behrisch and K. Wittmack (Springer-Verlag, Berlin, 1991) p. 305.CrossRefGoogle Scholar
  13. 13.
    U. S. Tandon, Vacuum 43, 3 (1992) 241.CrossRefGoogle Scholar
  14. 14.
    M. Paulus and F. Reverchon, J. Phys. Radium Phys. Appl. 22, Suppl. to No. 6 (1961) 103A.Google Scholar
  15. 15.
    R. A. D. Mackenzie, J. Vac. Sci. Technol. B9, 5 (1991) 2561.CrossRefGoogle Scholar
  16. 16.
    K. Gamo, Nucl. Instr. Meth. in Phys. Rev. B65 (1992) 40.CrossRefGoogle Scholar
  17. 17.
    Y. Ochiai, Y. Kojima and S. Matsui, J. Vac. Sci. Technol. B6, 4 (1988) 1055.CrossRefGoogle Scholar
  18. 18.
    L. R. Harriott, H. Temkin, R. A. Hamm, J. Weiner and M. B. Panish, ibid. B7, 6 (1989) 1467.CrossRefGoogle Scholar
  19. 19.
    K. Gamo, Vacuum 42 (1991) 89.CrossRefGoogle Scholar
  20. 20.
    P. A. Miller, J. Vac. Sci. Technol. B7, 5 (1989) 1053.CrossRefGoogle Scholar
  21. 21.
    Z. W. Kowalski, J. Mater. Sci. Lett. 9 (1990) 549.CrossRefGoogle Scholar
  22. 22.
    B. A. Banks, in “Ion bombardment modification of surfaces: fundamentals and applications”, edited by O. Auciello and R. Kelly (Elsevier, Amsterdam, 1984) p. 399.Google Scholar
  23. 23.
    Z. W. Kowalski, J. Mater. Sci. Lett. 6 (1987) 1207.CrossRefGoogle Scholar
  24. 24.
    R. F. W. Pease, J. Vac. Sci. Technol. B10, 1 (1992) 278.CrossRefGoogle Scholar

Copyright information

© Chapman & Hall 1994

Authors and Affiliations

  • Zbigniew W. Kowalski
    • 1
  1. 1.Technical University of WrocławWrocławPoland

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