Infrared absorption in thick film resistors
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Infrared absorption in polymer and glass-based thick film resistors has been measured between 400 and 1500 cm−1. Sample structures are discussed on the basis of X-ray, Fourier transform-infrared and resistance-temperature data. It is shown that in polymer-based thick film resistors, the particulate phase is mostly responsible for the infrared absorption between 400 and 900 cm−1, whereas the infrared absorption at higher wave numbers is related to the continuous phase. In glass-based thick film resistors, absorption is mostly determined by the highly doped glass. The results indicate that thick film resistors can be used as an absorbent coating in the 400–1500 cm−1 region by suitable selection of the continuous and particulate phases.
KeywordsPolymer Fourier Material Processing Thick Film Particulate Phase
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