Springer Nature is making SARS-CoV-2 and COVID-19 research free. View research | View latest news | Sign up for updates

Effect of cysteine on the kinetics of electroless nickel deposition

  • 112 Accesses

  • 11 Citations

Abstract

Cysteine is found to accelerate electroless nickel (EN) deposition and hydrogen evolution simultaneously. Changes in the activation energy of the EN reaction and the electrochemical behaviour of the EN bath due to the presence of cysteine were studied. The composition of the deposit formed was determined by XPS. The results show that the activation energy of the EN reaction is decreased when cysteine is added to the bath, and also that cysteine only influences the anodic process and has no direct effect on the cathodic process. The high resolution XPS spectra show that cysteine is adsorbed in the surface layer, and S2− in the inner layer of the deposit. It is deduced that cysteine may participate in the formation of a reactive intermediate and facilitate the oxidation of H2PO 2 , which results in the acceleration of EN plating.

This is a preview of subscription content, log in to check access.

References

  1. [1]

    A. Brenner and G. Riddell, Proc. AES An. Tech. Conf. 33 (1946) 16.

  2. [2]

    C. H. deMinjer and A. Brenner, Plating 44 (1957) 1927.

  3. [3]

    G. Gutzeit, ibid.. 47 (1960) 63.

  4. [4]

    J. L. Fang, Chemistry 4 (1978) 226.

  5. [5]

    K. Panker, Amer. Electroplating Society 71st Annual Technical Conference (1984) p. 16.

  6. [6]

    J. Kivel and J. S. Sallo, J. Electrochem. Soc. 112 (1965) 1203.

  7. [7]

    J. L. Fang, Y. Wu, M. Zhang and J. Fang, Mater. Protect. 27 (1994) 1.

  8. [8]

    A. Hung and I. Ohno, Plat. Surf. Finish. 54 (1990) 3.

  9. [9]

    J. L. Fang and N. J. Wu, J. Appl. Electrochem. 20 (1990) 231.

  10. [10]

    M. Paunovic, Plating 55 (1968) 1161.

  11. [11]

    S. Haruyama, A. Yoshizawa and I. Ohno, J. Met. Finish. Sac. Jap. 30 (1979) 289.

  12. [12]

    A. Hung and I. Ohno, J. Electrochem. Soc. 137 (1990) 918.

  13. [13]

    M. Paunovic, AES 1st Electroless Plating Symposium (1982) p. 2.

  14. [14]

    J. L. Fang, Acta Chimica Sinica 41 (1983) 29.

  15. [15]

    N. Feldstein and T. S. Lancsek, J. Electrochem. Soc. 118 (1971) 869.

  16. [16]

    C. D. Wagner, W. M. Riggs, L. E. Davis, J. E. Moulder and G. E. Muilenberg, ‘Handbook of X-ray Photoelectron Spectroscopy’, Perkin-Elmer Corp., Eden Frairie Minnesota (1978).

  17. [17]

    D. Dimroth, Angew. Chem. 46 (1933) 57.

  18. [18]

    R. M. Lukes, Plating 51 (1964) 69.

  19. [19]

    R. G. Pearson, J. Chem. Educ. 45 (1968) 581.

Download references

Author information

Correspondence to K. P. Han.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Han, K.P., Fang, J.L. Effect of cysteine on the kinetics of electroless nickel deposition. J Appl Electrochem 26, 1273–1277 (1996). https://doi.org/10.1007/BF00249930

Download citation

Keywords

  • Oxidation
  • Hydrogen
  • Nickel
  • Activation Energy
  • High Resolution