Skip to main content
SpringerLink
Log in

Technology and fabrication of quantum devices: Submicron lithography and etching techniques

  • Conference paper
  • First Online:
Physics and Technology of Semiconductor Quantum Devices

Part of the book series: Lecture Notes in Physics ((LNP,volume 419))

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  • G.R.Brewer, Editor Electron Beam Technology in Microfabrication Academic Press, New York (1980)

    Google Scholar 

  • Chang et al IBM J.Res.Develop. 32,462 (1988)

    Google Scholar 

  • F.C.Chen Introduction to Plasma Physics Plenum, New York (1977)

    Google Scholar 

  • P.A.M.Holweg, J.Caro, A.H.Verbruggen and S.Radelaar Fabrication of metallic nanoconstrictions Microelectronic Engineering 11 (1990) 27–30

    Google Scholar 

  • C.A.van der Jeugd, G.J.Leusink, G.CAM. Janssen and S.Radelaar Appl. Phys. Letters 57 (1990) 354–356

    Article  Google Scholar 

  • D.P.Kern in Quantum Effects Physics, Electronics and Applications, K.Ismail,T.Ikoma and H.I.Smith editors Institute of Physics Conference Series Number 127, p. 73–78

    Google Scholar 

  • A. Manenschijn, W.J.Goedheer Angular angular ion and neutral distribution in a collisional rf sheath J.Appl.Phys. 69 (1990) 2923–2930

    Google Scholar 

  • C.R.K.Marrian and E.A.Dobisz High-resolution lithography with a vacuum STM Ultramicroscopy 42-44, p.1309–1316 (1992)

    Google Scholar 

  • E.A.Dobisz and C.R.K.Marrian Scanning tunneling microscope lithography: A solution to electron scattering J.Vac.Sci. Technol. B 9 (1991) 3024–3027

    Google Scholar 

  • P.M. Petroff et al. in Quantum Effects Physics, Electronics and Applications K.Ismail,T.Ikoma and H.I.Smith editors Institute of Physics Conference Series Number 127 (1992),p 85–94

    Google Scholar 

  • J. Romijn and E. van der Drift Nanometer-scale lithography for large lateral structures Physica B 152 (1988) 14–21

    Article  Google Scholar 

  • AJ.van Roosmalen, J.A.G.Baggerman and S.J.H.Brader Dry Etching for VLSI Plenum Press, New York and London (1991)

    Google Scholar 

  • A.H.Verbruggen, P.A.M.Holweg, H.Vloeberghs, C.van Haesendonck, J.Romijn, S.Radelaar and Y. Bruynseraede. Microelectronic Engineering 13, 407 (1991)

    Article  Google Scholar 

  • A.C.Warren, D.A.Antoniadis, H.I.Smith and J.Melngailis IEEE Electron Device Letters EDL 6 (1985) 294

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. DIMES, (Delft Institute for Micro-Electronics and Submicrontechnology), Delft, The Netherlands

    Sybrand Radelaar

Authors
  1. Sybrand Radelaar
    View author publications

    You can also search for this author in PubMed Google Scholar

Editor information

Klaus H. Ploog Leander Tapfer

Rights and permissions

Reprints and permissions

Copyright information

© 1993 Springer-Verlag

About this paper

Cite this paper

Radelaar, S. (1993). Technology and fabrication of quantum devices: Submicron lithography and etching techniques. In: Ploog, K.H., Tapfer, L. (eds) Physics and Technology of Semiconductor Quantum Devices. Lecture Notes in Physics, vol 419. Springer, Berlin, Heidelberg. https://doi.org/10.1007/BFb0034402

Download citation

  • DOI: https://doi.org/10.1007/BFb0034402

  • Published:

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-56989-3

  • Online ISBN: 978-3-540-47850-8

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Search

Navigation