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On the Integration of SPC and APC: APC Can Be a Convenient Support for SPC

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Frontiers in Statistical Quality Control 10

Part of the book series: Frontiers in Statistical Quality Control ((FSQC,volume 10))

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Abstract

This paper is developed from Higashide et al. (Front Stat Qual Control 9:71–84, 2010). Automatic process control (APC) is frequently used in the semiconductor manufacturing process; however, statistical process control (SPC) is also needed to control the APC controller. This is an earlier paradigm on the integration of SPC and APC. Our viewpoint is different from the earlier one as follows:

  1. (a)

    APC reinforces SPC.

  2. (b)

    SPC complements APC.

Through case studies on the semiconductor manufacturing process, the remarks above are discussed. Our proposals for the integration of SPC and APC are as follows:

  1. (a)

    The process rate is used as the control characteristic to control the between-subgroup variation.

  2. (b)

    Principal component analysis is applied to control the within-subgroup variation.

These proposals can lead to developments of the traditional \(\bar{X} - R\) charts.

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References

  1. Box, G., & Kramer, T. (1992). Statistical process monitoring and feedback adjustment – a discussion. Technometrics,34(3), 251–285.

    Google Scholar 

  2. Capilla, C., Ferrer, A., & Romero, R. (1999). Integration of statistical and engineering process control in a continuous polymerization process. Technometrics,41(1), 14–28.

    Google Scholar 

  3. Gonzales, I., & Sanchez, I. (2008). Principal alarms in multivariate statistical process control. Journal of Quality Technology,40(1), 19–30.

    Google Scholar 

  4. Harris, T. J., & Ross, W. H. (1991). Statistical process control procedures for correlated observations. The Canadian Journal of Chemical Engineering,69, 48–57.

    Google Scholar 

  5. Higashide, M., Nishina, K., Kawamura, H., & Ishii, N. (2010). Statistical process control for semiconductor manufacturing process. Frontiers in Statistical Quality Control,9, 71–84.

    Google Scholar 

  6. Jackson, J. E., & Hearne, F. T. (1973). Relationships among coefficients of vectors used in principal components. Technometrics,15(3), 601–610.

    Google Scholar 

  7. Jackson, J. E., & Mudholkar, G. S. (1979). Control procedures for residuals associated with principal component analysis. Technometrics,21(3), 341–349.

    Google Scholar 

  8. Kawamura, H., Nishina, K., & Higashide, M. (2008a). Discount factors and control characteristics in the semiconductor manufacturing process. Proceedings of the 6th Asian Network Quality Congress 2008, CD. Bangkok: ANQ 2008.

    Google Scholar 

  9. Kawamura, H., Nishina, K., Higashide, M., & Shimazu, K. (2008b). Integrating SPC and APC in semiconductor manufacturing process. Quality,38(3), 99–107 (in Japanese).

    Google Scholar 

  10. MacGregor, J. F. (1988). On-line statistical process control. Chemical Engineering Process,84, 21–31.

    Google Scholar 

  11. MacGregor, J. F., & Harris, T. J. (1990). Exponential weighted moving average control schemes: Properties and enhancement – Discussion. Technometrics,32(1), 23–26.

    Google Scholar 

  12. Montgomery, D. C. (2001). Introduction to statistical quality control (4th ed.). New York: Wiley.

    Google Scholar 

  13. Montgomery, D. C., & Mastrangelo, C. M. (1991). Some statistical process control methods for autocorrelated data. Journal of Quality Control,23(3), 179–204.

    Google Scholar 

  14. Roes, K. B., & Does, R. J. M. M. (1995). Shewhart-type charts in nonstandard situations. Technometrics,37(1), 15–40.

    Google Scholar 

  15. Tsung, F., Shi, J., & Wu, C. F. J. (1999). Joint monitoring of PID-controlled processes. Journal of Quality Control,31(3), 275–285.

    Google Scholar 

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Correspondence to Ken Nishina .

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Nishina, K., Higashide, M., Kawamura, H., Ishii, N. (2012). On the Integration of SPC and APC: APC Can Be a Convenient Support for SPC. In: Lenz, HJ., Schmid, W., Wilrich, PT. (eds) Frontiers in Statistical Quality Control 10. Frontiers in Statistical Quality Control, vol 10. Physica, Heidelberg. https://doi.org/10.1007/978-3-7908-2846-7_8

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