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Introduction to Micro-/Nanofabrication

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Springer Handbook of Nanotechnology

Part of the book series: Springer Handbooks ((SHB))

Abstract

This chapter outlines and discusses important micro- and nanofabrication techniques. We start with the most basic methods borrowed from the integrated circuit (IC) industry, such as thin-film deposition, lithography and etching, and then move on to look at microelectromechanical systems (MEMS) and nanofabrication technologies. We cover a broad range of dimensions, from the micron to the nanometer scale. Although most of the current research is geared towards the nanodomain, a good understanding of top-down methods for fabricating micron-sized objects can aid our understanding of this research. Due to space constraints, we focus here on the most important technologies; in the microdomain these include surface, bulk, and high-aspect-ratio micromachining; in the nanodomain we concentrate on e-beam lithography, epitaxial growth, template manufacturing, and self-assembly. MEMS technology is maturing rapidly, with some new technologies displacing older ones that have proven to be unsuited to manufacture on a commercial scale. However, the jury is still out on methods used in the nanodomain, although it appears that bottom-up methods are the most feasible, and these will have a major impact in a variety of application areas such as biology, medicine, environmental monitoring, and nanoelectronics.

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Abbreviations

AFM:

atomic force microscope

AFM:

atomic force microscopy

ALD:

atomic layer deposition

BHF:

buffered HF

BiCMOS:

bipolar CMOS

CMOS:

complementary metal–oxide–semiconductor

CVD:

chemical vapor deposition

DC:

direct-current

DMD:

deformable mirror display

DMD:

digital mirror device

DNA:

deoxyribonucleic acid

DPN:

dip-pen nanolithography

DRIE:

deep reactive ion etching

EDP:

ethylene diamine pyrochatechol

EUV:

extreme ultraviolet

HARPSS:

high-aspect-ratio combined poly- and single-crystal silicon

HEXSIL:

hexagonal honeycomb polysilicon

HMDS:

hexamethyldisilazane

HOPG:

highly oriented pyrolytic graphite

IC:

integrated circuit

LIGA:

Lithographie Galvanoformung Abformung

LPCVD:

low-pressure chemical vapor deposition

LTO:

low-temperature oxide

MBE:

molecular-beam epitaxy

MEMS:

microelectromechanical system

MOCVD:

metalorganic chemical vapor deposition

OTS:

octadecyltrichlorosilane

PDMS:

polydimethylsiloxane

PECVD:

plasma-enhanced chemical vapor deposition

PLD:

pulsed laser deposition

PMMA:

poly(methyl methacrylate)

PSG:

phosphosilicate glass

PZT:

lead zirconate titanate

RCA:

Radio Corporation of America

RF:

radiofrequency

RHEED:

reflection high-energy electron diffraction

RIE:

reactive-ion etching

SAM:

scanning acoustic microscopy

SAM:

self-assembled monolayer

SCREAM:

single-crystal reactive etching and metallization

SEM:

scanning electron microscope

SEM:

scanning electron microscopy

SLIGA:

sacrificial LIGA

SOI:

silicon-on-insulator

SPM:

scanning probe microscope

SPM:

scanning probe microscopy

STM:

scanning tunneling microscope

STM:

scanning tunneling microscopy

SoS:

silicon-on-sapphire

TASA:

template-assisted self-assembly

TEM:

transmission electron microscope

TEM:

transmission electron microscopy

TI:

Texas Instruments

TMAH:

tetramethyl ammonium hydroxide

UV:

ultraviolet

VLSI:

very large-scale integration

VPE:

vapor-phase epitaxy

fcc:

face-centered cubic

hcp:

hexagonal close-packed

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Authors and Affiliations

  1. Birck Nanotechnology Center, Purdue University, 1205 W. State St., 47907-2035, West Lafayette, IN, USA

    Babak Ziaie

  2. Centro National Microelectrónica (CNM-CSIC), Institut de Microelectronica de Barcelona (IMB), Barcelona, Spain

    Antonio Baldi

  3. Department of Electrical and Computer Engineering, Western Michigan University, 49008-5329, Kalamazoo, MI, USA

    Massood Z. Atashbar

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  1. Babak Ziaie
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  2. Antonio Baldi
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  3. Massood Z. Atashbar
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Correspondence to Babak Ziaie , Antonio Baldi or Massood Z. Atashbar .

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  1. Ohio State University, Nanoprobe Laboratory for Bio- and Nanotechnology and Biomimetics (NLB2), 201 W. 19th Avenue, 43210-1142, Columbus, OH, USA

    Bharat Bhushan

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Ziaie, B., Baldi, A., Atashbar, M.Z. (2010). Introduction to Micro-/Nanofabrication. In: Bhushan, B. (eds) Springer Handbook of Nanotechnology. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-02525-9_8

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