, Volume 43, Issue 5, pp 1413-1422
Date: 12 Nov 2011

Stress Annealing Induced Diffuse Scattering from Ni3 (Al, Si) Precipitates

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Abstract

Diffuse scattering caused by L12 type Ni3 (Al, Si) precipitates after stress annealing of Ni-Al-Si alloys is studied. Peculiarities of diffuse scattering in the asymptotic region as compared to the Huang scattering region are discussed. Coupling between the stress annealing direction and the precipitate shape is demonstrated. Experimental reciprocal space maps (RSMs) are compared to theoretical ones. Oscillations of diffuse scattering due to Ni3 (Al, Sc) precipitates are observed. The strengths of the precipitates are estimated from the analysis of the diffuse scattering oscillations.

Manuscript submitted March 21, 2011.