Metallurgical and Materials Transactions A

, Volume 43, Issue 5, pp 1413–1422

Stress Annealing Induced Diffuse Scattering from Ni3 (Al, Si) Precipitates


    • Oak Ridge National Laboratory
  • G. E. Ice
    • Oak Ridge National Laboratory
  • E. A. Karapetrova
    • Materials Science and Technology DivisionAdvanced Photon Source
  • P. Zschack
    • Materials Science and Technology DivisionAdvanced Photon Source
Symposium: Neutron and X-Ray Studies of Advanced Materials IV

DOI: 10.1007/s11661-011-0937-z

Cite this article as:
Barabash, R.I., Ice, G.E., Karapetrova, E.A. et al. Metall and Mat Trans A (2012) 43: 1413. doi:10.1007/s11661-011-0937-z


Diffuse scattering caused by L12 type Ni3 (Al, Si) precipitates after stress annealing of Ni-Al-Si alloys is studied. Peculiarities of diffuse scattering in the asymptotic region as compared to the Huang scattering region are discussed. Coupling between the stress annealing direction and the precipitate shape is demonstrated. Experimental reciprocal space maps (RSMs) are compared to theoretical ones. Oscillations of diffuse scattering due to Ni3 (Al, Sc) precipitates are observed. The strengths of the precipitates are estimated from the analysis of the diffuse scattering oscillations.

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© The Minerals, Metals & Materials Society and ASM International (outside the USA) 2011