Symposium: Neutron and X-Ray Studies of Advanced Materials IV

Metallurgical and Materials Transactions A

, Volume 43, Issue 5, pp 1413-1422

First online:

Stress Annealing Induced Diffuse Scattering from Ni3 (Al, Si) Precipitates

  • R. I. BarabashAffiliated withOak Ridge National Laboratory Email author 
  • , G. E. IceAffiliated withOak Ridge National Laboratory
  • , E. A. KarapetrovaAffiliated withMaterials Science and Technology Division, Advanced Photon Source
  • , P. ZschackAffiliated withMaterials Science and Technology Division, Advanced Photon Source

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Diffuse scattering caused by L12 type Ni3 (Al, Si) precipitates after stress annealing of Ni-Al-Si alloys is studied. Peculiarities of diffuse scattering in the asymptotic region as compared to the Huang scattering region are discussed. Coupling between the stress annealing direction and the precipitate shape is demonstrated. Experimental reciprocal space maps (RSMs) are compared to theoretical ones. Oscillations of diffuse scattering due to Ni3 (Al, Sc) precipitates are observed. The strengths of the precipitates are estimated from the analysis of the diffuse scattering oscillations.