Abstract
A novel technology to manufacture holographic ion beam etched diffraction gratings based on surface thermokinematics is presented. The surface roughness of photoresist gratings is solved by this technology. According to this technology, a holographic ion beam etched blazed grating of 1200 l/mm for use in the ultraviolet region is manufactured. The experimental results show that the grating has good surface quality, low stray light and high diffraction efficiency. In addition, the performance of thes gratings satisfies the operating requirements of ultraviolet spectrograph.
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Li, Wh., Bayanheshig, Qi, Xd. et al. Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting. Optoelectron. Lett. 4, 177–179 (2008). https://doi.org/10.1007/s11801-008-7140-5
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DOI: https://doi.org/10.1007/s11801-008-7140-5