Abstract
The roughness of the contact surface exerts a vital role in rubbing. It is still a significant challenge to understand the microscopic contact of the rough surface at the atomic level. Herein, the rough surface with a special root mean square (RMS) value is constructed by multivariate Weierstrass–Mandelbrot (W–M) function and the rubbing process during that the chemical mechanical polishing (CMP) process of diamond is mimicked utilizing the reactive force field molecular dynamics (ReaxFF MD) simulation. It is found that the contact area A/A0 is positively related with the load, and the friction force F depends on the number of interfacial bridge bonds. Increasing the surface roughness will increase the friction force and friction coefficient. The model with low roughness and high lubrication has less friction force, and the presence of polishing liquid molecules can decrease the friction force and friction coefficient. The RMS value and the degree of damage show a functional relationship with the applied load and lubrication, i.e., the RMS value decreases more under larger load and higher lubrication, and the diamond substrate occurs severer damage under larger load and lower lubrication. This work will generate fresh insight into the understanding of the microscopic contact of the rough surface at the atomic level.
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Acknowledgements
The authors greatly appreciate the financial support of the National Key Research and Development Program of China (2022YFB3404304) and the National Natural Science Foundation of China (No. 5217052183). The authors acknowledge Beijng PARATERA Tech Corp., Ltd., China, for providing high-performance computing (HPC) resources that have contributed to the research results reported within this paper.
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Song YUAN. He is a Ph.D. student from School of Mechanical Engineering, Dalian University of Technology, China, focusing on the tribology theory and technology in ultra-precision machining, such as the chemical mechanical polishing and ReaxFF molecular dynamics simulations. He has published more than 30 papers, which have been cited for more than 300 times.
Xiaoguang GUO. She received her Ph.D. degree in 2008 from Dalian University of Technology, China. She is now working as a professor at School of Mechanical Engineering, Dalian University of Technology. She is the member of Extreme Manufacturing Branch of Chinese Mechanical Engineering Society, focusing on ultraprecision machining and theory regarding the hard and brittle. She has published more than 100 papers, which have been cited for more than 700 times.
Hao WANG. He is a Ph.D. student from School of Mechanical Engineering, Dalian University of Technology, China, focusing on ultra-precision machining theory and technology regarding the ultrasonic vibration assisted machining and molecular dynamics simulation. He has published more than 10 papers, many of which have been cited multiple times.
Renke KANG. He received his Ph.D. degree in 1999 from Northwestern Polytechnical University, China. He is now working as a professor at School of Mechanical Engineering, Dalian University of Technology, China. He is the member of International Committee of Abrasive Technology, focusing on ultraprecision machining and theory regarding the hard and brittle. He has published more than 380 papers, which have been cited for more than 3,800 times.
Shang GAO. He received his Ph.D. degree in 2014 from Dalian University of Technology, China. He is now working as an associate professor at School of Mechanical Engineering, Dalian University of Technology. He is the member of Extreme Manufacturing Branch of Chinese Mechanical Engineering Society, focusing on precision and ultra-precision machining technology, semiconductor manufacturing technology and equipment. He has published more than 50 papers, which have been cited for more than 400 times.
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Yuan, S., Guo, X., Wang, H. et al. Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond. Friction 12, 1119–1132 (2024). https://doi.org/10.1007/s40544-023-0760-8
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DOI: https://doi.org/10.1007/s40544-023-0760-8